Johnson: Nanofabrication Revolution: Atomic Layer Deposition and Etching at the Nanoscale, Kartoniert / Broschiert

Klappentext

"Nanofabrication Revolution: Atomic Layer Deposition and Etching at the Nanoscale" explores the cutting-edge world of building things incredibly small. It delves into two transformative techniques: Atomic Layer Deposition (ALD) and Atomic Layer Etching (ALE). Imagine building structures atom by atom, with incredible precision and control. That's the power of ALD and ALE, allowing scientists and engineers to create revolutionary materials and devices at the nanoscale, a billionth of a meter! The book dives into the unique processes behind these techniques, explaining how they use precise chemical reactions to meticulously add or remove material one atomic layer at a time. You'll learn about the vast applications of this technology, from creating ultra-thin films for transistors in next-generation computers to crafting intricate features for solar cells and medical implants. "Nanofabrication Revolution" unveils the exciting potential of ALD and ALE, ushering in a new era of miniaturization and innovation that will shape the future of technology.